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Electron Microscopy SEF

This facility has equipment for both Transmission Electron Microscopy (TEM), which allows the researcher to form images of thin slices or finely divided powders of samples at a resolution of down to 0.18nm, and for Scanning Electron Microscopy (SEM), a tool for visualizing the surface of solid samples with a resolution that can approach 1nm. Transmission Electron Microscopy (TEM) allows the researcher to form images of thin slices or finely divided powders of samples at a resolution of down to 0.18nm. Crystal structure may be analyzed by means of electron diffraction, and chemical analysis, with a sensitivity of a few atoms and spatial resolution of about 0.5nm, may be performed by energy-dispersive X-ray analysis (EDX) or electron energy-loss analysis (EELS). The Scanning Electron Microscopy (SEM) visualizes the surface of solid samples, with a resolution (depending on the application) that can approach 1nm. Energy-dispersive X-ray analysis can be used to analyze volumes with dimensions of around 1 micron with a sensitivity of about 0.1wt%, while back-scatter electron imaging allows the visualization of regions of different composition (in many cases). Crystallographic orientation and structure can be examined using backscatter electron diffraction analysis, though sample preparation requirements for this technique are very stringent and limit the number of samples that can be studied in this way.

Facility Type: 


  1. FEI Tecnai Multipurpose TEM

    The  FEI Tecnai (G2 Spirit TWIN) is a high quality 120 kV multipurpose TEM, providing high resolution and good contrast. The high-resolution TWIN lens allows for imaging at both moderate and high magnification up to 0.36 nm point-to-point resolution & 0.2 nm lattice resolution.  The digital TEM combines excellent performance with optimized ease-of-use for high resolution imaging, elemental analysis and mapping. 

  2. FEI/Philips XL30 FEG ESEM

    A high performance, extremely flexible and well-equipped microscope for general-purpose microscopy, low-vacuum and environmental scanning microscopy (ESEM). It is also equipped with a Peltier stage. Resolution at 30KV is 3.5 nm. The minimum magnification is about 20x.

  3. Helios Nanolab 600 Dual Beam Focused Ion Beam Milling System (FIB)

    Configured to carry out nano-scale characterization and nano-machining on a wide-range of materials from various study areas such as biotechnology, and materials and energy research. This instrument has magnetic immersion electron optics to give 0.9 nm resolution at 15kV. A high brightness field electron emitter can deliver a beam current up to 22 nA and the accelerating voltage from 350V to 30kV. The ion optics produces a resolution of 5.0 nm at 30KV and liquid Gallium emitter delivers 20 nA ion current and the voltage ranging from 0.5 kV to 30kV.

  4. JEOL 2010 Advanced High Performance TEM

    This instrument is an advanced, digitally controlled dedicated transmission electron microscope operating at 200KV with a lanthanum hexaboride cathode. It is capable of an ultimate point-to-point resolution of 0.19 nm, with the ability to image lattice fringes at 0.14 nm resolution.

  5. JEOL 2010 FEG Analytical Electron Microscope

    A multipurpose high resolution analytical electron microscope with high resolution image quality and high analytical performance, EDS X-ray analysis. The system is also equipped with a Gatan image filter (GIF) for EELS and energy filtered imaging, and a scanning image observation device (ASID), and 3 CCD cameras for various applications.

  6. JEOL 2011 High Contrast Digital TEM

    A high performance TEM with advanced features and functions. The electron gun allows high-brightness with filament-saving low emission current. Other features include friendly controls, automatic filament heating, high tilting 60 degree single tilting holder, cryo objective lens polepiece for characterizing soft materials, AMT digital imaging camera, and a transmission catholuminescence attachment.

  7. JEOL 5910 General Purpose SEM

    A general purpose digital SEM, with the following attributes: very easy to use, remotely accessible via the web, Bruker EDX system for elemental analysis and mapping, and NPGS system for electron beam lithography.

  8. Zeiss Merlin High-resolution SEM

    Zeiss Merlin high-resolution scanning electron microscope is a versatile electron beam characterization tool for semiconductor research, life and material sciences. It is capable of high resolution secondary electron imaging with a resolution of 0.8 nm at 15KV and 1.4 nm at 1 kV with in-lens secondary electron detector. It is also equipped with a retractable 4 Quads and an in-lens energy selective backscatter detectors for back-scattered electron imaging, an unique charge compensation system for imaging of non-conductive materials, and a scanning transmission electron microscopy (STEM) detector for studying of electron-transparent thin film samples. A software to reconstruct 3D surface topography is also available. Accessories include an EDS for X-ray microanalysis and elemental mapping and an EBSD for crystallographic texture study.