Our venerable Agilent/HP 8453 photodioarray single beam spectrophotometer is used for time-resolved kinetic studies in the spectral range of 175 to 1100nm.
The Materials Preparation and Measurement Laboratory (MPML) provides facilities for preparation, fabrication, processing, patterning and characterization of many types of samples. Instrumentation encompasses scanning probe microscopes (AFM and STM), scanning electron microscopes (SEM), optical lithography and imaging, sample cutting-polishing, surface coating, thermal characterization, optical characterization via steady-state and time-resolved fluorescence, absorbance, reflectance, Raman, and light scattering.
Training and Access
A key aspect of the lab is extensive one-on-one training with experienced PhD-level staff. After extensive training that covers operational procedures and safety training, it is possible for all users, from undergrads, graduate students, and postdocs, to REU summer students and external users of all levels, to operate instruments by themselves. Qualified users are given 24/7 access to the instruments. MPML staff may also provide direct service on an as-needed basis.
Recharge Rates
Recharge recovery is necessary to partially cover service contracts and equipment repairs. Most instruments are recharged based upon hours of use. Evaporators, RIE and Spin Coaters are recharged per use. We have simple flat rates for both internal and external users. However, precious metals (Gold, Platinum, Palladium and etc.) and most consumable supplies should be provided by research groups.
Recharges based on hours of use
Internal Users: $70.00/hr (training and use with assistance); $30/hr (use without assistance)
External Users: $111.30/hr (training and use with assistance); $47.70/hr (use without assistance)
Recharges for Evaporators, RIE and Spin Coater
Internal Users: $70.00 for training; $70/use (with assistance); $30.00/use (without assistance)
External Users: $111.30 for training; $111.30/use (with assistance); $47.70/use (without assistance)
Our venerable Agilent/HP 8453 photodioarray single beam spectrophotometer is used for time-resolved kinetic studies in the spectral range of 175 to 1100nm.
The Aglient Cary 5000 dual-beam spectrophotometer has a spectral range of 175 to 3300nm and can measure absobances for solid and liquid samples in a linear range up to OD8.
The Asylum MFP-3D-BIO is mounted on an inverted optical microscope to enable simultaneous brightfield, widefield epi-fluorescence, or phase imaging. The extended Z-head allows tapping mode and contact imaging within a range of 40µm in Z and 90µm in X and Y. It also is capable of nanomechanical property mapping, bimodal dual-AC imaging, single-molecule force extension measurements, conductive AFM, and STM.
The Bruker Multimodes are used most often for training, in-air and in-fluid imaging, and material property measurements. The Multimode 5 and 8 are both set up with the regular contact and tapping modes, while the 8 is also equipped with ScanAsyst, Peak Force Tapping, and Peak Force QNM (Quantitative Nanomechanical Property Measurement) modes. Multiple J, E and A scanners are available as well as magnetic force, electrochemical, and environmental capabilities.
The Bruker Multimodes are used most often for training, in-air and in-fluid imaging, and material property measurements. The Multimode 5 and 8 are both set up with the regular contact and tapping modes, while the 8 is also equipped with ScanAsyst, Peak Force Tapping, and Peak Force QNM (Quantitative Nanomechanical Property Measurement) modes. Multiple J, E and A scanners are available as well as magnetic force, electrochemical, and environmental capabilities.
The Bruker Standalone STM provides high sensitivity and high stability STM imaging with atomic resolution at low tunneling currents. A custom-built automated Pt/Ir tip etching system is nearby, so that STM tip can be freshly made when necessary.
Our general use grinder / polisher for use with a variety of materials
Our Carl Zeiss Merlin Field-Emission Scanning Electron Microscope (FE-SEM) is designed for high contrast low-voltage imaging of delicate samples with resolution better than one nanometer. The Merlin has several low-noise backscatter and secondary electron on-axis detectors, a novel charging compensation mode, and is our primary tool for studying soft materials samples such as polymers, nanoparticles, and active biological materials such as patterned silicon nanowires.
The FEI Nova NanoSEM 230 high resolution field emission SEM is our main imaging tool for nanoparticles, featuring 1nm resolution at 15 KV.
Automated ellipsometer for the measurement and mapping of film thicknesses and refractive indices on substrates up to 8" wide
The Hitachi S-2700 SEM is equipped with an NPGS 8.0 Nanopatterning system and can write patterns with features down to 50 nm in size.
The Horiba Fluorolog-3 spectrofluorometer is used for steady-state and time-resolved phosphorence measurements of solid, liquid, and thin film samples in the 200nm to 1050nm spectral range. The instrument has automated polarizers for anisotropy measurements, a Peltier-temperature-controlled sample chamber, a 4-position motorized sample chamber, and an integrating sphere for Quantum Yield measurements.
Semi-automatic wire bonder with tips for gold and aluminum wire
A new Horiba LabRAMHR Evolution NIR confocal raman microscope with:
Low speed diamond wheel saw for sample slicing.
Malvern Zetasizer Nano ZS light scattering system for the measurement of zeta potential, particle size, and molecular weight.
General purpose grinder & polisher
Olympus BH2 upright optical microscope with polarization optics and long-working distance objectives
200W Plasma etcher & cleaning system with oxygen and argon plasmas
Several Lindberg quartz tube furnaces for thermal processing of samples in inert gas purges. Temperatures up to 1100C and 1700C.
Available plasmas include He, CF4, O2 and SF6.
General purpose spincoater for preparation of thin films
The MPML has a TA Instruments Q600 SDT simultaneous DSC-TGA for thermal characterization of samples in terms of heat flows and weight changes.
Sputter coater with Pd/Pt target for electron microscopy sample preparation
Universal Laser Systems VLS4.60 laser cutter system with 50W CO2 laser and 24" x 18" cutting bed. Rapid prototyping with various kinds of plastic and wood. Rotary attachment.
Near and deep UV exposure systems for optical lithography
Electron beam depostion system for the preparation of surfaces with gold, silver, chromium, titanium, NiCr, copper, and silicon dioxide.
MRFN.org is supported by the MRSEC Program of the National Science Foundation. Image in the header is courtesy of CRISP MRSEC.