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UV Laser Materials Processing Workstation

Instrument types

This workstation includes a Coherent Ar+ 351-nm continuous wave laser source, which is used to record information in UV sensitive polymers. This source is coupled to an optical set-up designed for creating 1-, 2-, and 3-D interference patterns with periods of less than 0.5 ┬Ám. It is currently being used to pattern a variety of materials including commercially available photoresists and polymer dispersed liquid crystals.