- Schottky field emission gun for high resolution and excellent beam stability
- Large specimen chamber capable of imaging up to a 6" wafer -Spatial resolution of 1.5nm at 20kV and 3.5nm at 1kV
- High probe current with stability better than 0.5% per hour. Variable from 4pA to 10nA
- In-lens and lower SE detectors. Robinson backscattered electron detector for compositional contrast
- ElectronScribe beam writing interface for electron beam lithography
- Keithley 480 picoammeter and faraday cup for beam current monitoring
MRFN.org is supported by the MRSEC Program of the National Science Foundation. Image in the header is courtesy of CRISP MRSEC.
