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Program Application

ENSL Photo Lab

  • Ozone Cleaner
  • Optical Microscope
  • 60 Ton Press
  • Spinner in Fume Hood
  • Ultrasonic Cleaner
  • Optical Magnifier for making Photo Masks
  • Furnace - up to 300° C (No Fume Exhaust)

Available Processes:

  • Photo Lithography
  • E-beam Lithograpy
  • Photo Developing