Our electron beam lithography capability features a Leica/Vistec EBPG 5000 field-emission electron beam pattern generator (EBL01). The tool can operate at 50 and 100 keV using beam sizes as small as ~8 nm. We have in-house CAD layout and data fracturing capability and can accept GDSII, DXF (AutoCad), and CTEXT formats, among others. Our engineering staff is highly experienced in both industrial semiconductor mix-and-match (e-beam and photo) and research lithography.
Our standard e-beam processes include: