The MJB3 Mask Aligner is designed for high-resolution photolithography in a laboratory environment. It offers flexibility in the handling of irregularly shaped substrates of differing thicknesses, as well as standard size wafers up to 3” diameter. All operating controls are laid out in a simple, ergonomic design, making the operation of the aligner easy to learn and providing the versatility needed in specialized processes.

The MJB3 is equipped with a 350W lamp house containing a 350W mercury short-arc lamp. Primary exposure wavelengths are 350-450nm. The aligner can perform exposures in hard contact mode, soft contact mode, and vacuum contact mode. Line/space resolution of

The MJB3 is also equipped with a constant intensity controller (CIS) which regulates the lamp power to deliver constant intensity exposures.