The CEE-1 spinner is a PC-controlled spinner with a touch screen interface and display used for applying photoresist uniformly on a substrate. It is capable of spin speeds from 0 to 12,000 rpm and spin speed accelerations of 0 to 30,000 rpm/s. Spin speeds and time can be altered to achieve desired photoresist thickness. Substrate size capability is from <1cm to 200mm round. Over 250,000 recipes with multiple steps can be programmed.