This system is utilized for depositing high-quality thin films for: (1) generating multi-layer structures; and (2) to assist with LEAP-tip preparation by FIB milling where the thin-film deposit marks and protects a sample?s surface when milling with gallium ions. The ion-beam sputter system does not use magnetron-based sputter guns and therefore is suitable for the deposition of magnetic materials, such as iron, nickel, and cobalt.