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The Stabilizing Ion and Neutral Beam Assisted Deposition system is a specially designed system for the in-situ investigation of thin solid films. It is designed to handle the deposition of thin films onto thin 3mm TEM ready samples and investigate the effect of energetic particles on materials. The sample manipulation stage can be used for d.c. biasing of the sample as well as resistive heating during deposition and the unit is equipped with a single position electron-beam evaporator, a 4 keV ion-gun, and a compact electron cyclotron resonance (ECR) plasma source. It is also connected to the SPEAR system.