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Rigaku ATX-G Thin-film Diffraction Workstation

A high intensity 18 kW copper x-ray rotating anode source is coupled to a multilayer mirror. The system has selectable x-ray optical configurations suitable for work with single crystal, thin-film or poly-crystalline film samples. Also supported are grazing incidence, in-plane diffraction geometries, pole figures, reciprocal space mapping, and large-size wafer sample mounting. Other features are the 5-axis goniometer with several 4-crystal monochromators that couple to the multilayer mirror.