Vision 320
Description
The AV etcher is a RIE system with 6 etchant gases available. The current gases available are: Ar, CHF3, CF4, O2, SF6, and CH3OH. The system is designed to etch silicon, silicon nitride, silicon oxide, and photo-resist (and other permitted organics). With the use of the CH3OH gas, additional magnetic materials can be etched (Co, Fe, and Ni).
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