This new facility consists of an SEM (FEI XL-30) for electron-beam lithography, a probe station (Cascade 12000) for electrical characterization, and three scanned-probe microscopes (SPMs) for in situ electrical measurement of devices concurrent with electrostatic force and scanned-gate microscopy. One SPM (DI-Dimension 5000) is configured for electrically contacting samples, and another SPM (JEOL-4210) has controlled environment (ambient to high vacuum, 120-800K) and electrical feedthrus for in situ electrical measurements. This facility is operated cooperatively with the Department of Physics.