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Karl Suss MJB-3 Mask Aligner

Instrument types

The Karl Suss MJB3 UV300 is designed for high-resolution photolithography, with a 350 W mercury lamp and Suss diffraction-reducing exposure optics. The primary exposure wavelengths of 365 or 403 nm lead to roughly 1 ┬Ám minimum feature size. For smaller feature sizes, electron-beam lithography is available in the Electron Microscope Facility.