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Duke University - NC State University - UNC Chapel Hill - NCCU
Research Triangle MRSEC
Chapel Hill Analytical and Nanofabrication Laboratory (CHANL)
Facility Primary Contact:
Carrie Donley
Mask Aligner
The mask aligner allows you to expose a photoresist through a mask to generate a pattern.
News
Shared instrumentation facilities: Benefiting researchers and universities, and sustaining research excellence
Making the Best of a Bad Situation: A Characterization Seminar Series
How NSF's Materials Research Facilities Network helps bolster the field of materials science and engineering
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MRFN.org is supported by the MRSEC Program of the National Science Foundation. Image in the header is courtesy of CRISP MRSEC.