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Program Application

Heidelberg DWL 66+ laser writer lithography system

Instrument types

Nitrogen/vacuum polyimide film anneal. Temp to 300 C.

  • Diode laser compatible with standard 365 nm UV photoresists
  • Standard write mode can pattern features down to one micron
  • High resolution write mode can pattern features down to 300 nm lines and spaces, in sufficiently thin resist
  • Accepts substrates of any shape (round or square preferred)
  • Accepts transparent or opaque substrates
  • Accepts substrates as small as 5 mm x 5 mm (larger substrates preferred)
  • Automatic focus via optical or pneumatic systems