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Leica/Vistec EBPG 5000 Field-Emission Electron Beam Pattern Generator

Instrument types

Our electron beam lithography capability features a Leica/Vistec EBPG 5000 field-emission electron beam pattern generator (EBL01). The tool can operate at 50 and 100 keV using beam sizes as small as ~8 nm. We have in-house CAD layout and data fracturing capability and can accept GDSII, DXF (AutoCad), and CTEXT formats, among others. Our engineering staff is highly experienced in both industrial semiconductor mix-and-match (e-beam and photo) and research lithography.


Our standard e-beam processes include:

  • PMMA (2%) and HSQ patterning down to ~20 nm linewidths
  • ZEP520A patterning to ~60 nm linewidths
  • Inverted bilayer resist processing for robust liftoff to ~150 nm linewidths
  • 4" and 5" photomask and reticle fabrication for photolithography
  • Staff-assisted CAD layout help is available for simple designs