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Optical Lithography

Instrument types


Our optical lithography capability includes:

  • I-line (365 nm) stepper photolithography (STP01) to linewidths of ~0.70 microns
  • Contact photolithography to ~2 microns (ALN01, ALN02)
  • Standard Shipley 1813, 220 photolithography processes and both positive and negative reversal processes for AZ5214
  • Shipley LOR2A and LOR5A bilayer processes for robust liftoff processes
  • Standard SU-8 negative resist processes