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UHV Characterization & Growth System

Instrument types

UHV Characterization & Growth System:  This system is designed for high throughput experimental sample production and characterization to study both pre- and post graphene growth processes. The system has a two-stage load-lock for rapid introduction of either single 12mm x 6 mm sample or up to four simultaneous 5mm x 4mm samples.  The system is equipped with low energy electron diffraction (LEED) and Auger electron spectroscopy (AES) for preliminary assessment of sample quality and graphene film thickness.

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