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E-Beam Lithography System

Instrument types
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Elionix ELS-7500 EX E-Beam Lithography System

The ELS-7500EX is capable of producing ultra fine features down to a 10nm linewidth. It offers a Zr/W thermal field emission electron gun with a maximum 50Kev accelerating voltage and minimum beam diameter of 2nm. It has a Windows based CAD and GUI layout, with a conversion capability for previously generated CAD files. The Laser interferometer stage and 18 bit DAC beam positioning system provide excellent stitching and writing capabilities. The various stage options allow for patterning of substrate sizes ranging from small pieces (1cm) up to wafers that are 6" in diameter.