The MA6 Mask Aligner is designed for high-resolution photolithography in a laboratory environment. It also offers Backside Align capability with automated image capture and computer display optics. All operating controls are laid out in a simple, ergonomic design, making the operation of the aligner easy to learn and providing the versatility needed in specialized processes. Optics are on screen, with no eyepiece

The MA6 is equipped with a 350W lamp house containing a 350W mercury short-arc lamp. Primary exposure wavelengths are 350-450nm. The aligner can perform exposures in hard contact mode, soft contact mode, proximity mode, and vacuum contact mode. Line/space resolution of

The MA6 is also equipped with a constant intensity controller (CIS) which regulates the lamp power to deliver constant intensity exposures.

The MA6 is capable of running samples ranging in size from 10mm to 150mm. The mask holders can be used with masks ranging in size from 4" to 7" sq. Minimum mask thickness is .09".