The Jipelec JetFirst rapid thermal annealing (RTA) system is a bench top system designed for R&D applications. The temperature measurement and control system provides accurate and repeatable thermal control across the temperature range. Annealing can be performed in air, vacuum, N2, or forming gas (N2/H2).

The system is configured to process substrates up to 100mm in diameter. Smaller substrates and pieces can easily be processed by placing them on a silicon wafer.