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University of Utah
Next Generation Materials for Plasmonics and Organic Spintronics
UtahNanofab
Facility Primary Contact:
Ian Harvey
Instrument Technical Primary Contact:
Charles Fisher
More details about this Instrument
Plasma Reactive Ion Etcher
Make / Model :
Oxford 80+
Oxford 80+ Reactive Ion Etcher with Ar, CF4, CXl2, O2, and SF6 gases available.
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