The Oxford IonFab 300 system uses two Kaufman ion sources to do sputter deposition or Argon etching. It is especially well-suited for fabricating optical devices as it is capable of preparing exceptionally high-quality low-loss dielectric mirrors using HfO2/SiO2 multilayers. It can also be used for metal deposition and for well-controlled etching by Argon bombardment. It is computer-controlled and cryo-pumped, and it can accommodate up to 4" samples with tilt and rotation.