The Fiji tool creates thin films via atomic layer deposition, which is a type of chemical vapor deposition.

• ALD system with 6 precursor lines.
• 200mm chuck capable of heating to 300 deg. C
• Plasma generator for N2, O2 and H2
• Ozone generator.
• ALD Booster System
• LVPD system
• Materials available: Aluminum (Trimethylaluminum), Titanium (Tetrakis(dimethylamido)titanium(IV)), Niobium (Tris(diethylamido)(tert-butylimido)niobium(V)), Hafnium (Tetrakis(dimethylamido)hafnium(IV)), Silicon (Bis(diethylamido)silane)