HR FEG ultra high brightness field emission source. Two mode lens with immersion (high resolution by increasing NA>1) and free operation (undistorted low mag imaging).  Directional Back Scatter (DBS) detector included for both topographic and phase information, 5-axes motorized x-y-z-tilt=rotate stage with X=y=110 mm, Z=25 mm, tilt= +75deg to -15 deg, and eucentric tilt. High vacuum imaging resolution at 30kV of 0.8 nm. Nanometer Pattern Generation System for Electron Beam Lithography Will be installed in April 2016.