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FIB-FEI Helios NanoLab 660; DualBeam SEM/FIB Platform-pushing the limits of extreme high resolution characterization in 2D an 3D, nanoprototyping, and sample preparation

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FEI Helios NanoLab 660

<p>The focused ion beam (FIB) is an extension to a scanning electron microscope (SEM). With it one can image and modify a specimen with high spatial (~10 nm) resolution.&nbsp; Modifications include site specific material removal, material deposition and particle manipulation.&nbsp; In a FIB, a beam of ions impacts a sample and causes local sputtering, removing material in a controlled way.&nbsp; If a special deposition gas is introduced, it is decomposed on the surface and site-specific deposition occurs. This instrument also includes an SEM column for simultaneous imaging during ion beam modification and a manipulator for moving small particles.&nbsp; Applications include:&nbsp; efficient prototyping of complex patterns, site-specific cross-sections, 3D serial sectioning (imaging, EDS, EBSD), automated TEM sample prep, polymer/food/life sciences 3D-TEM prep, particle manipulation, crystalline grain imaging, and cryogenic studies via cryo-stage and preparation chamber.</p>